C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 3/33 (2006.01) B01D 53/52 (2006.01) B01D 53/56 (2006.01) B01D 53/60 (2006.01) B01D 53/77 (2006.01) C09K 3/00 (2006.01) C11D 17/08 (2006.01) C23C 18/38 (2006.01) C23C 18/40 (2006.01) G03C 7/42 (2006.01)
Patent
CA 2230282
Solutions comprising at least one polyamino disuccinic acid and one of more polyamino monosuccinic acids are useful in gas conditioning (preferably as the iron chelate). The copper chelates are also useful in electroless copper plating. Another aspect of the invention includes the use of the aminosuccinic acid mixtures in laundry detergent compositions.
Solutions comportant au moins un acide polyamino-disuccinique et un ou plusieurs acides polyamino-monosucciniques utiles dans le traitement de gaz (de préférence par chélate de fer). Les chélates de cuivre sont également utiles au dépôt de cuivre chimique. L'invention concerne également l'utilisation de mélanges à base d'acide amino-succinique dans des compositions détergentes de blanchissage.
Crump Druce K.
Wilson David A.
Dow Global Technologies Inc.
Smart & Biggar
The Dow Chemical Company
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