C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/212, 260/243
C07D 513/14 (2006.01) A61K 31/54 (2006.01)
Patent
CA 1276017
Sulfenamide Derivatives and Their Production Abstract of the Disclosure The compound of the formula ?X- Image wherein R1 is hydrogen, methoxy or trifluoromethy, R2 and R3 are the same or different and are each hydrogen or methyl, R4 is a fluorinated lower alkyl having 2 to 5 carbon atoms and 1 to 11 fluorine atoms and X- is a pharmaceutically anion, respectively, possesses both strong antisecretory activity and gastric mucosal protective activity, which is produced by reacting a pyridine derivative of the formula Image wherein R1, R2, R3 and R4 have the same meaning as defined above, with an acid.
529446
Maki Yoshitaka
Nohara Akira
Fetherstonhaugh & Co.
Takeda Pharmaceutical Company Limited
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