Sulfonate derivatives and the use therof as latent acids

Details Sulfonate derivatives and the use therof as latent acids Sulfonate derivatives and the use therof as latent acids

G - Physics

03

F

G03F 7/004 (2006.01) C07C 301/00 (2006.01) C07C 323/66 (2006.01) C07C 381/00 (2006.01) C07D 291/00 (2006.01)

Patent

CA 2474532

Chemically amplified photoresist compositions comprising, (a) a compound which cures upon the action of an acid or a compound whose solubility is increased upon the action of an acid; and (b) a compound of the formula (Ia), (Ib), (IIa), (IIb), (IIIa), (IIIb), (Iva), (Ivb), (Va), (Vb) or (VIa), wherein n is 1 or 2; m is 0 or 1; X0 is -[CH2]h-X or -CH=CH2; h is 2, 3, 4, 5 or 6; R1 when n is 1, is for example optionally substituted phenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl; R1, when n is 2, is for example optionally substituted phenylene or naphthylene; R2 for example has one of the meanings of R1; X is for example -OR20, -NR21R22, -SR23; X' is -X1-A3-X2-; X1 and X2 are for example -O-, -S- or a direct bond; A3 is e.g. phenylene; R3 has for example one of the meanings given for R1; R4 has for example one of the meaning given for R2; R5 and R6 e.g. are hydrogen; G i.a. is -S- or -O-; R7 when n is 1, e.g. is phenyl, optionally substituted, when n is 2, is for ex~ample phenylene; R8 and R9 e.g. are C1-C18alkyl; R10 has one of the meanings given for R7; R11 i.a. is C1-C18alkyl; R12, R13, R14, R15 R16, R17 and R18 for example are hydrogen or C1-~C18alkyl; R20, R21, R22 and R23 i.a. are phenyl or C1-C18alkyl; give high resolution with good resist profile.

La présente invention concerne des compositions pour photorésines chimiquement amplifiées. Elles comprennent, d'une part (a) un composé durcissant sous l'action d'un acide ou d'un composé dont la solubilité est augmentée par l'action d'un acide, et d'autre part (b) un composé représenté par les formules (Ia), (Ib), (IIa), (IIb), (IIIa), (IIIb), (Iva), (Ivb), (Va), (Vb) ou (VIa). Dans ces formules, n vaut 1 ou 2; m vaut 0 ou 1; X¿0? est -[CH¿2?]¿h?-X ou -CH=CH¿2?; h est 2, 3, 4, 5 ou 6; pour n = 1, R¿1? est phényle, naphtyle, anthracyle, phénantryle, ou hétéroaryle éventuellement substitué; pour n = 2, R¿1? est phénylène ou naphtylène éventuellement substitué; R¿2? a l'une des significations de R¿1?; X est -OR¿20?, -NR¿21?R¿22?, -SR¿23?; X' est -X¿1?-A¿3?-X¿2?-; X¿1? et X¿2? sont -O-, -S- ou une liaison directe; A¿3? est phénylène; R¿3? a l'une des significations de R¿1?; R¿4? a l'une des significations de R¿2?; R¿5? et R¿6? sont hydrogène; G est essentiellement -S- ou -O-; pour n = 1, R¿7? est phényle éventuellement substitué, et pour n = 2, il est phénylène; R¿8? et R¿9? sont C¿1?-C¿18? alkyle; R¿10? a l'une des significations de R¿7?; R¿11? est essentiellement C¿1?-C¿18? alkyle; R¿12?, R¿13?, R¿14?, R¿15?, R¿16?, R¿17? et R¿18? sont hydrogène ou C¿1?-C¿18? alkyle; R¿20?, R¿21?, R¿22? et R¿23? sont essentiellement phényle ou C¿1?-C¿18? alkyle. Ces compositions se distinguent par une résolution élevée pour un bon profil de la photorésine.

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