C - Chemistry – Metallurgy – 08 – L
Patent
C - Chemistry, Metallurgy
08
L
400/1208, 400/13
C08L 25/18 (2006.01) C08F 8/36 (2006.01) C09K 3/16 (2006.01) G03C 1/89 (2006.01) G03F 7/26 (2006.01) G03G 5/10 (2006.01)
Patent
CA 1135433
Abstract of the Disclosure Disclosed herein are microgel compositions useful for the preparation of electrically conductive or antistatic layers in radiation sensitive materials, and particularly in photographic materials. The compositions comprise an aqueous dispersion of a sulfonated crosslinked polymer, preferably mixed with a binder. The polymer particles average less than one micron in diameter. Also disclosed herein is a method of preparing these microgel compositions.
305012
Campbell Gerald A.
Kelley Richard N.
Eastman Kodak Company
Gowling Lafleur Henderson Llp
LandOfFree
Sulfonated anionic microgel latices useful as antistatic agents does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Sulfonated anionic microgel latices useful as antistatic agents, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sulfonated anionic microgel latices useful as antistatic agents will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-150143