C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 317/50 (2006.01) A61K 31/165 (2006.01) C07C 317/44 (2006.01)
Patent
CA 2041144
ABSTRACT Sulfonylalkanoic acid amide derivatives represented by the formula Image ( I ) wherein X is a halogen atom, and Y is a hydrogen atom or a halogen atom, have much stronger and prolonged muscle relaxing effect with low side effect.
Hatada Yuichi
Hatayama Katsuo
Kameo Kazuya
Takahashi Yuki
Tomisawa Kazuyuki
Fetherstonhaugh & Co.
Hatada Yuichi
Hatayama Katsuo
Kameo Kazuya
Taisho Pharmaceutical Co. Ltd.
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