Sulfonyloximes for i-line photoresists of high sensitivity...

Details Sulfonyloximes for i-line photoresists of high sensitivity... Sulfonyloximes for i-line photoresists of high sensitivity...

G - Physics

03

F

G03F 7/038 (2006.01) C07C 303/02 (2006.01) G03F 7/004 (2006.01)

Patent

CA 2280365

Composition which can be activated by light, comprising at least one compound which may be crosslinked by the action of an acid and/or at least one compound which changes its solubility under the action of an acid, and as photoinitiator at least one compound generating a sulfonic acid under the exposure of light of a wavelength of 240 to 390 nm and having a molar extinction coefficient .epsilon. below 10 at i-line (365 nm) are especially suitable for the preparation of negative and positive photoresists, printing plates, image recording materials or colour filters.

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