C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
260/502.5
C08G 65/334 (2006.01)
Patent
CA 1041537
ABSTRACT OF THE DISCLOSURE Disclosed are alkali or ammonium polyoxapolyfluoroalkane- sulphonates having the general formula: A- [CF2O-(C2F4O)m (Cf2o)n-CF2]-B and the free acids thereof, in which the oxyperfluoroalkylene units -C2F4O- and -CF2O- are randomly distributed along the chain; m and n are integers whose sum is a number from 2 to 50, and preferably from 4 to 20; the m/n ratio is between 0.2 and 1.5; A is a mono- valent radical -CH2O-R-SO3M, wherein R is a divalent radical in alpha-gamma or alpha-delta position and is selected from the class consisting of alkylene, cycloalkylene, arylene and benzylene radi- cals, optionally containing, as substituents, chiorine atoms or alkylene or alkoxy groups; and M is an atom of alkali metal, hydrogen or an ammonium group; and B is the same as A or is the radical -CH2OH. These products are prepared by reacting .alpha.,.omega.-bis(hydroxyme- thyl) polyoxaperfluoroalkanes having the general formula HO-CH2- [CF2O-(C2F4O)m(CF2O)n-CF2] -CH2OH, or the alkali or ammonium dialcoholates thereof, with a sultone of formula Image wherein R is a divalent radical in alpha-gamma or alpha-delta position and is selected from the class consisting of alkylene, cycloalkylene, arylene and benzylene radicals. The so-obtained products are of particular interest because they are high stability surfactants.
227819
Bernardi Giancarlo
Pontoglio Enrico
Strepparola Ezio
Montedison S.p.a.
Na
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