Surface cleaning using a cryogenic aerosol

Details Surface cleaning using a cryogenic aerosol Surface cleaning using a cryogenic aerosol

B - Operations, Transporting

05

D

B05D 1/02 (2006.01) B08B 3/12 (2006.01) B08B 5/00 (2006.01) B08B 7/00 (2006.01) B24C 1/00 (2006.01) B24C 3/32 (2006.01) H01L 21/00 (2006.01)

Patent

CA 2043445

A method is disclosed for cleaning microelectronic surfaces using an aerosol of at least substantially solid argon particles which impinge upon the surface to be cleaned and then evaporate and the resulting gas is removed by venting along with the contaminants dislodged by the cleaning method.

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