Surface modification using hydridosilanes to prepare monolayers

C - Chemistry – Metallurgy – 09 – D

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C09D 183/04 (2006.01) B05D 1/18 (2006.01)

Patent

CA 2373265

A method of modifying a surface is disclosed. The method includes contacting the surface with a hydridosilane under conditions and for a time sufficient to form a covalent bond between a silicon atom of the hydridosilane and the oxygen atom of a hydroxyl group on the surface. The hydridosilane has formula (I), where at least one of Ra, Rb, Rc, and Rd is H, and at least one of Ra, Rb, Rc, and Rd is not H.

L'invention concerne une méthode de modification de surface, qui consiste à mettre ladite surface au contact d'un hydridosilane dans des conditions et durant un laps de temps suffisants pour former sur cette surface une liaison covalente entre un atome de silicium de l'hydridosilane et l'atome d'oxygène d'un groupe hydroxyle. L'hydridosilane est représenté par la formule (I) dans laquelle au moins l'un quelconque de R?a¿, R?b¿, R?c¿ et R?d¿ est H, et au moins l'un quelconque de R?a¿, R?b¿, R?c¿ et R?d¿ est différent de H.

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