C - Chemistry – Metallurgy – 25 – D
Patent
C - Chemistry, Metallurgy
25
D
C25D 3/02 (2006.01) C25D 7/00 (2006.01) G03F 7/16 (2006.01) H05K 3/00 (2006.01)
Patent
CA 2109678
18 ABSTRACT OF THE DISCLOSURE Disclosed is a process for surface treating an electrodeposition type photosensitive resin film, comprising electrocoating a photosensitive resin composition on a copper plate for a printed circuit board to form a resist layer, characterized by that an aqueous solution containing a surfactant is applied on the electrodoposited film and then dried.
Nishijima Kanji
Seio Mamoru
Suga Kazuyuki
Kirby Eades Gale Baker
Nippon Paint Co. Ltd.
Nishijima Kanji
Seio Mamoru
Suga Kazuyuki
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