Susceptor for use in chemical vapor deposition apparatus and...

C - Chemistry – Metallurgy – 23 – C

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204/175, 204/96

C23C 16/54 (2006.01) C23C 16/458 (2006.01) C23C 16/50 (2006.01) H05H 1/34 (2006.01)

Patent

CA 2034765

NOVEL SUSCEPTOR FOR USE IN CHEMICAL VAPOR DEPOSITION APPARATUS AND ITS METHOD OF USE ABSTRACT OF THE DISCLOSURE A composite susceptor for forming uniform deposits by chemical vapor deposition. The composite susceptor has an electrically conducted layer of material disposed on a block of material which is adapted to be heated by an induction heating coil. The conductive layer is electrically biased to control the geometry of the gas plasma. By electrically controlling the geometry of the gas plasma, more uniform deposition of a material on a substance is achieved. A composite susceptor having a segmented conductive layer for producing a graded electrical profile and a conductive ring surrounding a gas plasma are also described. In one aspect, a phase-shifting layer of material is disposed on the conductive layer.

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