System and method for dispensing pressurized gas

F - Mech Eng,Light,Heat,Weapons – 17 – C

Patent

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Details

F17C 13/02 (2006.01) F17C 7/00 (2006.01)

Patent

CA 2418588

A system for dispensing pressurized gas is provided which includes a pressurized gas source, a receiving tank, a gas flow line connected between the gas source and the receiving tank, a valve for initiating and terminating flow of gas between the gas source and the receiving tank, an electronic controller, and temperature and pressure sensors for sensing temperature and pressure of gas inside the receiving tank. The electronic controller stores a tank rated density and the temperature and pressure of gas and periodically calculates a density of the gas in the receiving tank based on the temperature and pressure. The electronic controller periodically compares the density of the gas with the tank rated density and initiates flow of gas through the valve when the density in the receiving tank is below the rated density and terminates flow of gas through the valve when the density reaches the tank rated density.

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