B - Operations – Transporting – 01 – D
Patent
B - Operations, Transporting
01
D
B01D 65/02 (2006.01) B01D 61/18 (2006.01) B01D 61/20 (2006.01) B01D 63/02 (2006.01) C02F 1/44 (2006.01)
Patent
CA 2374830
A system is provided for withdrawing permeate from a substrate through a filter and for cleaning the filter in situ. The system includes a vessel configured to contain a substrate and a compartment connected to receive substrate from the vessel and connected to return a portion of received substrate to the vessel during normal operation of the system. The system also includes a filter positioned at least partially within the compartment to withdraw permeate from substrate in the compartment during normal operation of the system. A source of cleaning solution is connected to the compartment to deliver cleaning solution into the compartment and into contact with the filter during cleaning operation of the system. The compartment facilitates circulation of substrate in the vessel during normal operation of the system and substantially prevents introduction of cleaning solution from the compartment into contact with substrate contained in the vessel during cleaning operation. A method is also provided.
L'invention concerne un système destiné à extraire le perméat d'un substrat à travers un filtre et à nettoyer le filtre in situ. Le système comprend un récipient configuré pour contenir un substrat ainsi qu'un compartiment relié pour recevoir le substrat du récipient et relié pour renvoyer une partie du substrat reçu dans le récipient pendant le fonctionnement normal du système. Le système comprend également un filtre positionné au moins partiellement à l'intérieur du compartiment afin d'extraire un perméat du substrat dans le compartiment pendant le fonctionnement normal du système. Une source de solution de nettoyage est reliée au compartiment afin d'acheminer une solution de nettoyage dans le compartiment en contact avec le filtre pendant l'opération de nettoyage du système. Le compartiment facilite la circulation du substrat dans le récipient pendant le fonctionnement normal du système et empêche sensiblement l'introduction de la solution de nettoyage provenant du compartiment en contact avec le substrat contenu dans le récipient, pendant l'opération de nettoyage. Un procédé est également prévu.
Del Vecchio Michael Arthur
Loudon Robert Eben
Sutton Paul Matthew
Envirogen Inc.
Gowling Lafleur Henderson Llp
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