H - Electricity – 01 – J
Patent
H - Electricity
01
J
H01J 37/317 (2006.01) G03F 7/20 (2006.01) G06F 19/00 (2006.01) H01J 37/147 (2006.01) H01J 37/30 (2006.01) H01J 37/305 (2006.01) H01L 21/027 (2006.01)
Patent
CA 2334388
An electron beam writing system includes an electron beam patterning machine operable to emit an electron beam to form a pattern on a substrate. A computer control system, coupled to the electron beam patterning machine, has a plurality of pre-computed distortion maps. Each distortion map describes expected distortions of the substrate caused by bulk heating resulting from exposure to the electron beam. The computer control system controls the electron beam patterning machine using the distortion maps in order to adjust for the expected distortions.
L'invention concerne un système d'écriture à faisceau électronique comprenant une machine de formation de motifs par faisceau électronique permettant d'émettre un faisceau électronique qui esquisse un motif sur un substrat. Un système de commande informatique, couplé à une machine de formation de motifs par faisceau électronique, présente une pluralité de cartes de distorsions précalculées. Chaque carte décrit les distorsions que le substrat peut subir en raison de la chaleur de masse à la suite de l'exposition au faisceau électronique. Le système de commande informatique commande la machine de formation de motifs grâce aux cartes de distorsion de manière à régler les distorsions attendues.
Chilese Francis C.
Shamoun Bassam
Trost David
Etec Systems Inc.
Osler Hoskin & Harcourt Llp
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