C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 263/10 (2006.01) B01F 7/26 (2006.01)
Patent
CA 2691661
A method for producing toluene diisocyanate is disclosed which comprises forming a dispersion comprising phosgene gas bubbles dispersed in toluene diamine liquid phase, wherein said gas bubbles have a mean diameter less than 1 micron; and subjecting the dispersion to phosgenation reaction conditions, whereby at least a portion of the toluene diamine is phosgenated to form toluene diisocyanate. A system for carrying out the phosgenation of toluene diamine is also disclosed.
L'invention concerne un procédé de production de diisocyanate de toluène qui consiste à produire une dispersion qui contient des bulles de gaz phosgène dispersées dans une phase liquide de toluène diamine, ces bulles possédant un diamètre moyen inférieur à 1 micron; et à soumettre la dispersion à des conditions de réaction de phosgénation, au moins une partie du toluène diamine étant phosgénée pour former du diisocyanate de toluène. L'invention concerne également un système destiné à mettre en oeuvre la phosgénation de toluène diamine.
Anthony Rayford G.
Bagherzadeh Ebrahim
Borsinger Gregory
Hassan Abbas
Hassan Aziz
H. R. D. Corporation
Ridout & Maybee Llp
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