System, apparatus, and method for generating directional...

F - Mech Eng,Light,Heat,Weapons – 03 – H

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F03H 1/00 (2006.01)

Patent

CA 2621463

The present invention provides method, apparatus, and system that generates and uses a motive and other force by introducing a plasma environment into an asymmetric capacitor, resulting in a significant gain in force. In one embodiment, the energy field is energized by applying a system to increase a plasma density by ionizing the plasma environment in the energy field through electromagnetic radiation, by increasing the plasma temperature, or some combination thereof. The invention also generates a flow of energy or plasma directed outward from the apparatus. The present invention can also provide the motive forces at a variety of angles at substantially reduced voltage levels.

L'invention concerne un procédé, un appareil et un système générant et utilisant une force motrice et d'autres forces par l'introduction d'un environnement plasma dans un condensateur asymétrique, avec pour effet un gain net de force. Selon un mode de réalisation, le champ énergétique est alimenté par application d'un système qui augmente la densité de plasma par ionisation de l'environnement plasma dans le champ énergétique via un rayonnement électromagnétique, par augmentation de la température du plasma ou par la combinaison des deux. L'invention génère également un flux d'énergie ou de plasma orienté vers l'extérieur de l'appareil. L'invention peut aussi exercer des forces motrices selon un grand éventail d'angles à des niveaux de tension nettement réduits.

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