System for measurement of process control fluid consumption

G - Physics – 01 – F

Patent

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G01F 1/00 (2006.01) G01M 3/26 (2006.01)

Patent

CA 2637653

A system and method for accurately measuring supply gas consumed by a particular process control component within a process control system is disclosed. Enhanced measurement accuracy is derived from measuring the consumption of the process control component in a normal operating mode of the process control system. The amount of fluid expended by one process control component is separated by a fluid control system from the amount of supply gas expended in actuating other process control components. The amount of fluid expended by each component may be determined by measuring a decrease in a fluid within a vessel having a known quantity that independently supplies supply gas to each component during its operation.

L'invention concerne un système et un procédé permettant de mesurer précisément le gaz d'alimentation consommé par un élément particulier de commande de processus faisant partie dun système de commande de processus. On obtient une précision de mesure supérieure en mesurant la consommation de l'élément de commande de processus quand le système de commande de processus fonctionne en mode normal. La quantité de fluide utilisée par un élément de commande de processus est séparée, par un système de régulation de fluide, de la quantité de gaz d'alimentation utilisée pour actionner d'autres composants de commande de processus. On peut déterminer la quantité de fluide utilisée par chaque composant en mesurant la diminution d'un fluide dans un récipient de capacité connue qui alimente indépendamment chaque composant en gaz pendant le fonctionnement de celui-ci.

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