System including improved cathode for continuous deposition...

C - Chemistry – Metallurgy – 30 – B

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

148/3.5

C30B 35/00 (2006.01) C23C 16/509 (2006.01) C23C 16/54 (2006.01)

Patent

CA 1205363

SYSTEM INCLUDING IMPROVED CATHODE FOR CONTINUOUS DEPOSITION OF AMORPHOUS MATERIAL ABSTRACT OF THE DISCLOSURE A continuous system for depositing at least one layer of amorphous semiconductor material upon a sub- strate. Feed and takeup reels advance a thin film substrate through the system. At least one chamber is located intermediate the feed and takeup reels wherein a plasma is generated by the glow discharge of a reaction gas mixture. Apparatus associated with the chamber provides close regulation of plasma/substrate surface equilibrium to assure that a uniform layer of amorphous material is deposited. A chamber cathode, including a top surface electrode is adapted to provide a substanti- ally uniform distribution of reaction gas during deposi- tion by means of a plurality of baffles that equalizes path lengths from a reaction gas source to the electrode and from the electrode to a vacuum chamber. The elec- trode is electrically insulated from a plurality of gas exits to confine the plasma to the region between the electrode and the active surface of the substrate. Additional subsystems include a servo-controlled reel drive to regulate substrate tension and an inert gas curtain to isolate the interior of the chamber.

397385

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

System including improved cathode for continuous deposition... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with System including improved cathode for continuous deposition..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System including improved cathode for continuous deposition... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1196794

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.