Systems and methods for correcting optical reflectance...

F - Mech Eng,Light,Heat,Weapons – 21 – V

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F21V 9/16 (2006.01)

Patent

CA 2605467

We disclose measurement systems and methods for measuring analytes in target regions of samples that also include features overlying the target regions. The systems include: (a) a light source; (b) a detection system; (c) a set of at least first, second, and third light ports which transmit light from the light source to a sample and receive and direct light reflected from the sample to the detection system, generating a first set of data including information corresponding to both an internal target within the sample and features overlying the internal target, and a second set of data including information corresponding to features overlying the internal target; and (d) a processor configured to remove information characteristic of the overlying features from the first set of data using the first and second sets of data to produce corrected information representing the internal target.

Cette invention concerne des systèmes et des procédés de mesure permettant de mesurer des analytes dans des régions cibles d'échantillon comprenant des éléments qui recouvrent lesdites régions. Le système est composé comme suit: (a) source lumineuse; (b) système de détection; (c) ensemble constitué d'un premier, d'un second et d'un troisième passages pour la lumière qui transmettent la lumière entre la source lumineuse et l'échantillon et qui reçoit et dirige la lumière réfléchie par l'échantillon vers le système de détection en générant un premier ensemble de données qui incluent des informations à la fois sur une cible intérieure à l'échantillon et sur des éléments qui recouvrent la cible intérieure; e (d) processeur conçu pour éliminer les caractéristiques d'information des éléments qui recouvrent la cible du premier ensemble de données au moyen des premier et second ensembles de données et pour produire des informations corrigées représentant la cible interne.

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