Target based on molybdenum and production method with...

C - Chemistry – Metallurgy – 23 – C

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C23C 4/12 (2006.01)

Patent

CA 2757900

The invention relates to a target of nominal thickness, comprising at least one compound based on molybdenum, said target being characterised in that it has a lamellar microstructure, an oxygen rate lower than 1000 ppm, preferably lower than 600 ppm, and especially preferably lower than 450 ppm, an electrical resistance of less than 5 times, preferably 3 times, and especially preferably twice the theoretical electrical resistance of the compound.

Cible d'épaisseur nominale (e), comprenant au moins un composé à base de molybdène, caractérisée en ce qu'elle présente : -une microstructure lamellaire, - un taux d'oxygène inférieur à 1000 ppm, préférentiellement inférieur à 600 ppm, et de manière encore plus préférentielle inférieur à 450 ppm - une résistivité électrique inférieure à 5 fois, de préférence 3 fois, de préférence encore à 2 fois la résistivité électrique théorique du composé.

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