Target for a sputtering source

Details Target for a sputtering source Target for a sputtering source

C - Chemistry, Metallurgy

23

C

C23C 14/46 (2006.01)

Patent

CA 2583982

A target for a sputtering source can be subdivided into a plurality of exchangeable target segments (9). Each target segment (9) contains coating material, wherein each target segment (9) borders on at least two adjacent target segments (9', 9"), wherein each target segment is connectable to a base body (2, 13, 15) by means of at most one securing means (7, 8, 10)

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