D - Textiles – Paper – 03 – D
Patent
D - Textiles, Paper
03
D
D03D 15/00 (2006.01) C03C 15/00 (2006.01)
Patent
CA 2084591
ABSTRACT OF THE DISCLOSURE A rip resistant fabric comprises equispaced stress relief elements that increase the ripping strength of the fabric. The stress relief elements comprise gaps or comprise yarns which are extensible or are significantly weaker than the majority of the yarns of which the fabric is constructed. In tightly-woven synthetic fabrics such stress relief yarns may comprise, in whole or in part, hygroscopic materials to improve wearing comfort.
As Represented By The Ministe R. Of National Defence Her Majesty The Queen In Right Of Canada
Aspila Kalevi P.
Osczevski Randall J.
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