Technique for cw or quasi cw operation of planar electrode...

Details Technique for cw or quasi cw operation of planar electrode... Technique for cw or quasi cw operation of planar electrode...

H - Electricity

01

S

345/38

H01S 3/03 (2006.01) H01S 3/0971 (2006.01)

Patent

CA 1138083

11 45,602 ABSTRACT OF THE DISCLOSURE A glow discharge device positioned upstream in a flow laser gas system supplies a continuous flow of electrodes to a laser discharge region defined between planar laser electrodes to develop sufficient background electron density to permit CW or quasi CW laser operation.

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