Telecentric nuv-duv irradiator for out-of-contact exposure...

G - Physics – 02 – B

Patent

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Details

G02B 27/09 (2006.01) F21V 13/04 (2006.01) G02B 27/18 (2006.01) G03F 7/20 (2006.01) G21K 5/00 (2006.01) G21K 5/04 (2006.01)

Patent

CA 2189928

A condenser lens system is provided for forming an effective circular source of NUV-DUV radiation which is the telecentric stop of the system and is characterized by a short focal length and higher marginal irradiance to compensate for marginal cosine losses. The system utilizes a long arc medium/low pressure mercury lamp which is surrounded by a large paraboloidal reflector and is mounted below the focal point of the reflector to generate a converging radiation beam directed to the condenser lens system. The system then projects the effective circular source of NUV-DUV radiation to a lens system comprising two plano convex lenses to convert the effective circular source into a collimated beam for out-of-contact printing of large substrates. The highly collimated and spatially coherent beam can be used to irradiate a telecentric objective for projection exposure on wafer steppers or flood exposure systems.

Lentille de champ collectif servant à former une source circulaire efficace de rayonnement ultraviolet proche ou de rayonnement ultraviolet lointain (NUV-DUV) qui est le diaphragme télécentrique du système, caractérisé par une distance focale et un éclairement énergétique marginal plus élevé pour compenser les pertes marginales en fonction du cosinus. Le système fait appel à une lampe à vapeur de mercure à pression moyenne/basse à arc long qui est entourée d'un grand réflecteur parabolique, et installée sous le foyer du réflecteur, pour produire un faisceau de rayonnement convergent dirigé sur le système à lentille de champ collectif. Le système projette ensuite la source circulaire efficace de rayonnement NUV-DUV sur un système optique comprenant deux lentilles plan-convexes pour convertir la source circulaire efficace en un faisceau collimaté pour l'impression sans contact de substrats de grande dimension. Le faisceau très collimaté et convergent sur le plan spatial peut servir à irradier un objectif télécentrique pour l'exposition de la projection sur des graveurs à répétition ou des systèmes de sensibilisation par arrosage.

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