Temperature compensated alignment system

H - Electricity – 01 – L

Patent

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356/132, 356/194

H01L 21/68 (2006.01) G03F 7/20 (2006.01) G03F 9/00 (2006.01) H01L 21/477 (2006.01)

Patent

CA 1131369

Abstract of the Disclosure A temperature control system for adjusting the tempera- ture of a projection mask to cause it to align optically with a wafer, and thereafter, to automatically maintain the temperature differential between the mask and wafer constant.

341599

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