Ternary gas mixture and application of this mixture to the...

C - Chemistry – Metallurgy – 09 – K

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C09K 3/00 (2006.01) C01B 3/02 (2006.01) C23C 4/00 (2006.01) H05H 1/42 (2006.01)

Patent

CA 2255409

Gaz plasmagène constitué d'un mélange ternaire d'helium, d'argon et d'hydrogène, caractérisé en ce qu'il contient moins de 30% d'hélium, au moins 55% d'argon et de 5,5 à 15% d'hydrogène. Le gaz plasmagène selon l'invention est susceptible d'être utilise dans un procédé de traitement thermique, tel la projection plasma d'un matériau réfractaire ou metallique.

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Ternary gas mixture and application of this mixture to the... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ternary gas mixture and application of this mixture to the..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ternary gas mixture and application of this mixture to the... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1996964

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.