Terpolymers containing sulfur dioxide for electron beam...

Details Terpolymers containing sulfur dioxide for electron beam... Terpolymers containing sulfur dioxide for electron beam...

G - Physics

03

F

96/175, 204/91.5

G03F 7/039 (2006.01) C08G 75/22 (2006.01)

Patent

CA 1041347

TERPOLYMERS FOR ELECTRON BEAM POSITIVE RESISTS Abstract of the Disclosure Electron beam positive resists are formed from terpolymers of (a) an alpha olefin, (b) sulfur dioxide, and (c) a compound selected from the group consisting of cyclopentene, bicyclo- heptene and methyl methacrylate. The terpolymers have the particular unexpected advantage of being resistant to cracking of the films.

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