Tethered sulfonium salt photoinitiators for free radical...

Details Tethered sulfonium salt photoinitiators for free radical... Tethered sulfonium salt photoinitiators for free radical...

C - Chemistry, Metallurgy

08

F

117/199, 402/373

C08F 2/50 (2006.01) C07C 381/12 (2006.01) C07D 209/86 (2006.01) C07D 295/096 (2006.01) C07D 295/112 (2006.01) C07D 295/135 (2006.01) G03F 7/029 (2006.01)

Patent

CA 2003569

ABSTRACT OF THE DISCLOSURE Free radical polymerizable compositions contain a sulfonium salt which is tethered to at least one of an electron donor and a sensitizer, and a polymerizable monomer, demonstrate substantially enhanced photosensitivity. This invention also provides layered structures comprising a substrate coated with a free radical polymerizable composition containing a sulfonium salt which is tethered to at least one of an electron donor and a sensitizer, and the polymerized layered structures. A method for the preparation of certain tethered sulfonium salts is described.

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