C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/200.1, 260/2
C07D 223/32 (2006.01) C07D 313/06 (2006.01) C07D 313/14 (2006.01) C07D 337/06 (2006.01) C07D 337/14 (2006.01)
Patent
CA 1087174
Abstract of the Disclosure: The specification discloses novel tetracyclic compounds of the formula: Image wherein R1 is hydrogen or C1-C3 alkyl, R2 is C1-C3 alkyl, Y1 is hydrogen or halogen, X1 is a divalent radical selected from the group consisting of -O-, -S-, -N(R3)- and -CO- and R3 is hydrogen or C1-C3 alkyl, and the pharmaceutically acceptable salts thereof, which are useful as antidepressants and can be produced by various methods. - 1 -
291693
Kameno Yoshito
Katsube Junki
Kojima Atsuyuki
Kirby Eades Gale Baker
Sumitomo Chemical Co. Ltd.
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