C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/209, 260/241
C07D 487/04 (2006.01) A61K 31/55 (2006.01) C07D 471/14 (2006.01)
Patent
CA 2026925
ABSTRACT OF THE DISCLOSURE Compounds of formula (I): Image (I) [in which: Q is nitrogen or =CH-; R1 and R2 are hydrogen, alkyl, alkoxy, hydroxy, trifluoromethyl or halogen; and R3 is various specific substituted alkyl groups] and pharmaceutically acceptable salts thereof have valuable anti-allergic and anti-asthmatic activities. They may be prepared by reacting a corresponding compound where R3 is replaced by a hydrogen atom with a compound to introduce the group R3.
Fukumi Hiroshi
Iizuka Yoshio
Sakamoto Toshiaki
Sugiyama Mitsuo
Yamaguchi Takeshi
Marks & Clerk
Sankyo Company Limited
LandOfFree
Tetracyclic compounds having anti-allergic and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Tetracyclic compounds having anti-allergic and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Tetracyclic compounds having anti-allergic and... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1706224