C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
167/179, 260/267
C07C 211/30 (2006.01) A61K 31/135 (2006.01) C07D 295/00 (2006.01) C07D 295/03 (2006.01) C07D 295/073 (2006.01)
Patent
CA 1325011
ABSTRACT The invention relates to tetrahydronaphthalene and indane derivatives with the general formula I: Image I wherein R1 represents zero to four substituents, which may be the same or different and are selected from OH, halogen, NO2, CN, CF3, C1-C4 alkyl, C1-C4 alkoxy and unsubstituted or C1-C4 alkyl substituted amino; R2 represents C1-C4 alkyl, C1-C4 alkenyl and C1-C4 alkynyl which may be substituted by halogen; R3 and R4 represent independently H, C1-C4 alkyl or form together with the nitrogen atom a 5- or 6-membered ring; n has the value 0 or 1; ALK is an aliphatic hydrocarbon with 1-8 carbon atoms and their pharmaceutically acceptable salts. These new compounds are typical monoamine reuptake blockers with additional .alpha.2 antagonist activity and show strong anti-depressant activity without being sedative. Compounds according to this invention are also suitable for treating patients with anxiety disorders, e.g. panic disorder.
610916
Cairns James
Rae Duncan R.
Akzo N.v.
Cairns James
Fetherstonhaugh & Co.
Rae Duncan R.
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