C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 257/04 (2006.01) A61K 31/41 (2006.01) A61K 31/47 (2006.01) C07D 401/12 (2006.01) C07D 403/12 (2006.01)
Patent
CA 2086117
ABSTRACT The invent1on relates to a compound of the following general formula [I] or a pharmacologically acceptable salt thereof. Image [ I ] [wherein A means -(O)m-(CH(R4))n- (R4 is hydrogen or alkyl; m and n each is 0 or 1); B means oxygen or -S(O)p- (p is 0 to 2) ; R' means hydrogen, lower alkyl, lower alkoxy, halogen, haloalkyl or hydroxy; R2 means alkyl, alkenyl or aralkyl, which may be substituted or unsubstituted; R9 means hydrogen, lower alkoxy or halogen; R9 means hydrogen, lower alkyl, lower alkoxy, lower acyloxy, halogen, nitro or hydroxy; R10 means hydrogen or lower alkyl]. This compound has antiallergy and antiinflammatory activities and is of use as a therapeutic agent for bronchial asthma, allergic rhinitis and so on.
Inoue Kichiro
Makita Yoshihiko
Nakanouchi Kei
Yasufuku Shoji
Yoshimoto Yoshihiko
Nippon Shinyaku Co. Ltd.
Osler Hoskin & Harcourt Llp
LandOfFree
Tetrazole derivatives and drugs does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Tetrazole derivatives and drugs, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Tetrazole derivatives and drugs will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-2009678