Tfel devices having insulating layers

Details Tfel devices having insulating layers Tfel devices having insulating layers

H - Electricity

01

L

H01L 33/00 (2006.01) C23C 14/08 (2006.01) H01L 49/02 (2006.01) H05B 33/12 (2006.01) H05B 33/22 (2006.01)

Patent

CA 2284031

A thin film electroluminescent device has a bottom substrate and a first electrode layer deposited on the bottom substrate. The first insulating layer is deposited on the first electrode layer. A phosphor layer is deposited on the first insulating layer. A second insulating layer is deposited on the phosphor layer. A second electrode layer is deposited on the second insulating layer. In one aspect of the invention, at least a portion of the first insulating layer includes a layer of aluminum titanium oxide, and at least a portion of the second insulating layer includes a layer of a fusing dielectric material. In another aspect of the invention, the first insulating layer includes a layer of a refractory metal oxide deposited using DC reactive sputtering, and the second insulating layer includes a layer of a fusing dielectric material. In another aspect of the invention, the first insulating layer includes a refractory metal oxide layer, the metal oxide selected from the group consisting of zirconia, hafnia, tantala and niobium oxide, the first insulating layer further including a barrier layer between the first electrode layer and the refractory metal oxide layer, and a second barrier layer between the metal oxide layer and the phosphor layer. In yet another aspect of the invention, the second insulating layer includes a layer of a fusing dielectric material and a phosphor interface layer.

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