C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 1/68 (2006.01) C11D 1/722 (2006.01) C11D 1/825 (2006.01) C11D 3/22 (2006.01) C11D 3/37 (2006.01) C11D 1/66 (2006.01)
Patent
CA 2227222
A process for reducing foam in an alkyl polyglycoside-containing cleaning composition by adding a defoaming-effective amount of an alkoxylated alcohol having the general formula (I): R1(EO)x(PO)y-OH, wherein R1 is derived from a linear or branched alkyl chain having from about 8 to about 14 carbon atoms; x is a number having a value of from 1 to about 10; y is a number having a value of from 1 to about 10, to a composition containing an alkyl polyglycoside having the general formula (II): R3O(R4O)b(Z)a, wherein R3 is a monovalent organic radical having from about 6 to about 30 carbon atoms; R4 is divalent alkylene radical having from 2 to 4 carbon atoms; Z is a saccharide residue having 5 or 6 carbon atoms; b is a number having a value from 0 to about 12; a is a number having a value from 1 to about 6.
Procédé de réduction de la mousse dans une composition nettoyante contenant un polyglycoside d'alkyle par addition d'une quantité antimoussante efficace d'un alcool alkoxylé de formule générale (I): R¿1?(EO)¿x?(PO)¿y?-OH où R¿1? est dérivé d'une chaîne alkyle linéaire ou ramifiée possédant de 8 à 14 atomes de carbone environ, x désignant un nombre de 1 à 10 environ et y un nombre de 1 à 10 environ; dans une composition contenant un polyglycoside d'alkyle de formule générale (II): R¿3?O(R¿4?O)¿b?(Z)¿a? où R¿3? désigne un radical organique monovalent possédant de 6 à 30 atomes de carbone environ, R¿4? un radical alkylène bivalent possédant de 2 à 4 atomes de carbone, Z un résidu de saccharide possédant 5 ou 6 atomes de carbone, b un nombre de 0 à 12 environ et a un nombre de 1 à 6 environ.
Henkel Corporation
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
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