C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
C07F 7/12 (2006.01) C07F 7/08 (2006.01)
Patent
CA 2079853
THERMAL DISPROPORTIONATION OF ARYLHALOSILANES ABSTRACT The present invention is a process for the thermal disproportionation of arylhalosilanes containing at least one hydrogen bonded to silicon. The process involves heating the arylhalosilanes in liquid phase to a temperature within a range of about 250°C. to 450°C. The present process is particularily useful for the disproportionation of phenyldi- halosilanes to diphenyldihalosilanes.
Dow Corning Corporation
Gowling Lafleur Henderson Llp
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