Thermal stabilization of photoresist images

Details Thermal stabilization of photoresist images Thermal stabilization of photoresist images

G - Physics

03

C

356/147

G03C 5/00 (2006.01) G03F 7/40 (2006.01)

Patent

CA 1262579

THERMAL STABILIZATION OF PHOTORESIST IMAGES ABSTRACT OF THE DISCLOSURE Application of a high temperature resistant film forming polymer has previously proved successful in stabilizing photoresist image layers, particularly those used for high resolution geometries in microelectronic applications, against distortion or degradation by the heat generated during subsequent etching, ion implanta- tion processes and the like. It has been found that, when the thickness of the photoresist image layer exceeds about 1 micron, the coating of the film forming polymer tends to distort and or cause cracks, breaks and the like in the photoresist resulting in loss of the required geometry in the image. In accordance with the invention this problem can be overcome by applying the film forming polymer in the form of an ultrasonically atomized spray under controlled conditions.

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