G - Physics – 03 – C
Patent
G - Physics
03
C
96/219, 6/48
G03C 5/00 (2006.01) G03F 7/40 (2006.01)
Patent
CA 1279155
THERMALLY STABILIZED PHOTORESIST IMAGES ABSTRACT OF THE DISCLOSURE Photo resist image layers, particularly those used for high resolution geometries in microelectronic appli- cations, are stabilized against distortion or degrada- tion by the heat generated during subsequent etching, ion implantation processes and the like, by the applica- tion of a film of a thermally stabilizing agent prior to postdevelopment bake of the image layer. The process serves to achieve thermal stabilization of the photoresist image layer without significantly affecting the ease of subsequent stripping of the layer. It is particularly effective when used to thermally stabilize positive resist images derived from photo- resist systems based on novolak resins.
523167
Grunwald John J.
Spencer Allen C.
Grunwald John J.
Macdermid Incorporated
Morton International Inc.
Perley-Robertson Hill & Mcdougall Llp
Spencer Allen C.
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