G - Physics – 02 – B
Patent
G - Physics
02
B
G02B 5/08 (2006.01) H01S 3/00 (2006.01)
Patent
CA 2640511
In a multilayer mirror (6) for EUV radiation, which contains a layer sequence (7), arranged on a substrate (3), of a multiplicity of layer pairs (5) of in each case a first layer (1) composed of a first material and a second layer (2), applied thereon, composed of a second material, the first layers (1) and the second layers (2), according to the invention, each have a thickness of more than 2 nm, and the first material or the second material is a silicon boride or a molybdenum nitride.
Dans le miroir multicouche (6) selon l'invention pour le rayonnement EUV qui contient une série de couches (7) disposée sur un substrat (3) et constituée d'une multitude de paires de couches (5) chacune composée d'une première couche (1) d'un premier matériau et d'une seconde couche (2) d'un second matériau disposée sur la première, les premières couches (1) et les secondes couches (2) présentent chacune une épaisseur supérieure à 2 nm, et le premier matériau ou le second matériau est un borure de silicium ou un nitrure de molybdène.
Benoit Nicolas
Feigl Thorsten
Kaiser Nobert
Yulin Sergiy
Fetherstonhaugh & Co.
Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung
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