Thermally stable positive resist

Details Thermally stable positive resist Thermally stable positive resist

G - Physics

03

C

96/160

G03C 1/52 (2006.01) G03F 7/022 (2006.01)

Patent

CA 1265948

ABSTRACT A thermally stable, positive resist is provided which is useful in ultra violet lithography. The positive resist composition contains a polymer system, a sensitizer system, and a solvent for the polymer system and the sensitizer system. The polymer system contains a phenolic resin, and pref- erably a novolak-type resin compatible with the phenolic resin. The sensitizer system contains a photosensitive agent and a thermosensitive cross- linking agent for the phenolic resin. The photosen- sitive agent is a diazoketone compound insoluble in aqueous alkaline solution that absorbs radiation in the near ultra violet region of the spectrum pro- viding decomposition products soluble in aqueous alkaline solution. The thermosensitive cross- linking agent is a bisarylazide compound that absorbs radiation in the deep ultra violet region of the spectrum and that cross-links the phenolic compound when exposed to elevated temperatures.

465786

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