C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
154/140, 400/505
C08F 110/02 (2006.01) B32B 27/08 (2006.01) C08F 110/14 (2006.01) G02B 6/44 (2006.01)
Patent
CA 1298681
ABSTRACT Disclosed is a high abuse-resistance film suitable for making bags and pouches. The film has at least one layer comprising a linear copolymer of ethylene and an alpha-olefin with a density of about 0.935 g/cc or less. The copolymer has a comparatively lower I10/I2 ratio than the corresponding ethylene/alpha-olefin with the same comonomer and essentially the same density and essentially the same melt index at condition 190/2.16. 404/870807/7/
564228
Smart & Biggar
W.r. Grace & Co.,-Conn.
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