C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/211, 260/246
C07D 417/14 (2006.01) A61K 31/44 (2006.01) A61K 31/535 (2006.01) C07D 401/04 (2006.01)
Patent
CA 1311754
ABSTRACT OF THE DISCLOSURE A thiazole compound of the formula: Image wherein R1 is amino optionally having suitable substituent(s), R2 is hydrogen, lower alkyl or aryl, R3 is hydrogen, nitro, amino optionally having suitable substituent(s), hydroxy or lower alkoxy, A is lower alkylene, Q is hydrogen or halogen, and a heavy solid line means a single or double bond, and a pharmaceutically acceptable salt thereof, process for the preparation thereof and pharma- ceutical composition comprising the same. These compounds have an antiallergic activity and may be used for the treatment of allergic diseases such as allergic asthma, allergic rhinitis, allergic conjuctivitis, chronic urticaria, or the like in humans or animals.
523787
Manabe Takashi
Matsuda Hiroshi
Matsuo Masaaki
Ueda Ikuo
Fujisawa Pharmaceutical Co. Ltd.
Manabe Takashi
Matsuda Hiroshi
Matsuo Masaaki
Swabey Ogilvy Renault
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