C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/302, 260/266
C07D 277/20 (2006.01) C07C 45/00 (2006.01) C07D 277/22 (2006.01) C07D 277/28 (2006.01) C07D 277/40 (2006.01) C07D 277/42 (2006.01) C07D 277/46 (2006.01) C07D 277/48 (2006.01) C07D 277/50 (2006.01) C07D 417/02 (2006.01)
Patent
CA 1154764
ABSTRACT OF THE DISCLOSURE Thiazole derivatives and their process of prepara- tion are provided having: Image (I) wherein R1 is hydrogen, amino, or mono- or di- substituted amino, in which the substitutent is selected from lower alkyl. acyl and di(lower)alkylaminomethylene, R2 is hydrogen. halogen, lower alkyl or aryl. R3 is ar(lower)alkyl optionally substituted by halogen, A is lower alkylene optionally interrupted by a sulfur atom, and Y is C1-C3alkylene, and their pharmaceutically acceptable salts, the derivatives have antiallergic activities and can be used in the treatment of allegic symptoms.
367494
Morino Daizou
Takimoto Koichi
Ueda Ikuo
Fujisawa Pharmaceutical Co. Ltd.
Swabey Mitchell
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