C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/231, 167/234
C07D 417/12 (2006.01) A61K 31/425 (2006.01) A61K 31/44 (2006.01) C07D 277/48 (2006.01) C07D 417/04 (2006.01) C07D 417/14 (2006.01)
Patent
CA 2025356
ABSTRACT Compound of the formula: Image wherein R1 is amino which may have suitable substituent(s), hydroxy, halogen, cyano, acyl, heterocyclic thio, heterocyclic group or a group of the formula : Image in which R4 is hydrogen, cyano or acyl, and R5 is amino or lower alkoxy, R2 and R3 are each hydrogen, acyl or lower alkyl which may have halogen; or R2 and R3 are linked together to form lower alkylene, Y is Image or Image , in which R6 is hydrogen or halogen, and A is bond or lower alkylene, provided that when R1 is amino which may have suitable substituent(s) and A is bond; or R1 is lower alkylthioureido and A is lower alkylene, then Y is Image and pharmaceutically acceptable salts thereof. These compounds and their salts possess an antiulcer activity and an H2-receptor antagonism. They are useful for the therapeutic treatment of gastritis, ulcers such as gastric ulcer, duodenal ulcer, anastomotic ulcer, and the like, Zollinger- Ellison Syndrome, reflux esophagitis, upper gastrointestinal bleeding, and the like. The preparation of these compounds and salts, pharmaceutical compositions containing same, as well as medical treatments using them are also disclosed.
Inoue Yoshikazu
Katsura Yousuke
Takasugi Hisashi
Tomishi Tetsuo
Fujisawa Pharmaceutical Co. Ltd.
Swabey Ogilvy Renault
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