C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 417/14 (2006.01) A61K 31/445 (2006.01) A61K 31/495 (2006.01) C07D 417/04 (2006.01)
Patent
CA 2045755
ABSTRACT OF THE DISCLOSURE Compounds of formula (I): (I) Image [in which R1 is optionally substituted pyridyl; R2 is hydrogen, alkyl or optionally substituted pyridyl; R3 is hydrogen or various organic groups; R4 is hydrogen or alkyl; A is alkylene; and Z is a substituted piperidyl, piperazinyl or homopiperazinyl group which is substituted at least by a di-substituted methyl, methoxy or methylene group, each substituent being phenyl or heterocyclyl]; and pharmaceutically acceptable salts thereof have anti-allergic, anti-asthma and anti-PAF activities. Methods of making the compounds are also provided.
Fukumi Hiroshi
Hiroshi Fukumi
Iijima Yasuteru
Mitsuo Sugiyama
Oshima Takeshi
Fukumi Hiroshi
Iijima Yasuteru
Marks & Clerk
Oshima Takeshi
Sakamoto Toshiaki
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