Thick film equilibrium process and device

B - Operations – Transporting – 01 – D

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

B01D 15/00 (2006.01) B01D 53/04 (2006.01) B01D 53/22 (2006.01) B01D 61/00 (2006.01) B01D 61/36 (2006.01) B01J 20/34 (2006.01)

Patent

CA 2160789

There is disclosed a method for removing a volatile component from a feed or process stream comprising (1) absorbing or adsorbing the volatile component into an absorbent or adsorbent material in an equilibrium process, wherein feed is pumped through a mixture chamber of a device, wherein the device comprises the mixture chamber and a vapor chamber, wherein the mixture chamber comprises a plurality of films comprising absorbent or adsorbent materials, wherein the film is configured to have a first side communicating with the mixture chamber and a second side communicating with the vapor chamber, and (2) removing the volatile component from the absorbent or adsorbent material by applying heat to the mixture chamber and simultaneously applying a gas phase within the vapor chamber such that the volatile component is collected in a gaseous state in the vapor chamber. There is further disclosed a device for removing a volatile component from a feed comprising an enclosed two-chambered device having a mixture chamber and a vapor chamber, wherein the mixture chamber comprises a plurality of absorbent or adsorbent materials configured to have a first side communicating with the mixture chamber and a second side communicating with the vapor chamber, wherein the absorbent or adsorbent materials comprise a thick film having a thickness of from about 0.1 mm to about 5 mm thick with optional protuberances.

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Thick film equilibrium process and device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Thick film equilibrium process and device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thick film equilibrium process and device will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1363197

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.