Thick single crystal diamond layer method for making it and...

C - Chemistry – Metallurgy – 30 – B

Patent

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Details

C30B 25/02 (2006.01) C23C 16/27 (2006.01) C30B 25/10 (2006.01) C30B 25/20 (2006.01) C30B 29/04 (2006.01) C30B 33/00 (2006.01)

Patent

CA 2412855

A layer of single crystal CVD diamond of high quality having a thickness greater than 2 mm. Also provided is a method of producing such a CVD diamond layer. The method involves the homoepitaxial growth of the diamond layer on a low defect density substrate in an atmosphere containing less than 300ppb nitrogen. Gemstones can be manufactured from the layer.

L'invention concerne une couche de diamant monocristallin produit par dépôt chimique en phase vapeur, ladite couche étant de grande qualité et présentant une épaisseur supérieure à 2 mm. L'invention concerne également un procédé de fabrication d'une couche de diamant produit par dépôt chimique en phase vapeur. Ledit procédé fait intervenir la croissance homoépitaxiale de la couche de diamant sur un substrat ayant une faible densité de défauts dans une atmosphère contenant moins de 300 ppM d'azote. Des pierres précieuses peuvent en outre être fabriquées à partir de ladite couche.

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