C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 4/04 (2006.01) C23C 16/40 (2006.01)
Patent
CA 2074331
ABSTRACT OF THE DISCLOSURE The present invention refers to the deposition of thin film coatings produced by plasma-activated chemical vapor deposition of volatile fluorinated cyclic siloxanes of the structure [RR'Sio], in which R is a hydrocarbon radical with 1-6 carbon atoms, R' is a fluorinated hydrocarbon radical with 1-6 carbon atoms, the carbon in the alpha and beta positions with respect to the silicon atom is hydrogenated and x is 3 or 4.
Caporiccio Gerardo
D'agostino Riccardo
Favia Pietro
Caporiccio Gerardo
D'agostino Riccardo
Favia Pietro
Gowling Lafleur Henderson Llp
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