Thin-film el device, and its fabrication process

Details Thin-film el device, and its fabrication process Thin-film el device, and its fabrication process

H - Electricity

05

B

H05B 33/02 (2006.01) H01L 49/02 (2006.01) H05B 33/10 (2006.01) H05B 33/22 (2006.01)

Patent

CA 2352527

The invention has for its object to provide, without incurring any cost increase, a thin-film EL device in which a dielectric layer is corrected for non-flat portions to have a smooth surface, thereby ensuring enhanced display quality, and its fabrication process. This object is achieved by the provision of a thin-film EL device having at least a structure comprising an electrically insulating substrate (11), a lower electrode layer (12) stacked on the substrate according to a given pattern, a multilayer dielectric layer (13) formed thereon by repeating a solution coating-and-firing step plural times, and a light-emitting layer (14), a thin-film insulator layer (15) and a transparent electrode layer (16) stacked on the dielectric layer. The multilayer dielectric layer has a thickness of at least four times as large as a thickness of the electrode layer and 4 µm to 16 µm inclusive. The fabrication process is also provided.

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