Thin film thermal print head

Details Thin film thermal print head Thin film thermal print head

B - Operations, Transporting

41

J

204/96.06

B41J 2/335 (2006.01)

Patent

CA 1113884

THIN FILM THERMAL PRINT HEAD Abstract A thin film thermal print head is fabricated using radio frequency (rf)or direct current (DC) sputtering within a vacuum chamber into which is introduced a partial pressure of argon and nitrogen. Without breaking the vacuum three consecutive layers comprising respectively tantalum nitride, gold and tantalum nitride are sputter deposited and a diffusion barrier formed on a glazed substrate material. After these steps the desired land patterns are formed by photo lithographic techniques and chemical etching and finally sealant and abrasion resistant coatings are applied.

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