Thioethylamide derivatives

Details Thioethylamide derivatives Thioethylamide derivatives

C - Chemistry, Metallurgy

07

D

260/361.1, 260/3

C07D 307/54 (2006.01) C07D 307/52 (2006.01) C07D 307/68 (2006.01) C07D 333/20 (2006.01) C07D 333/38 (2006.01) C07D 405/06 (2006.01) C07D 409/06 (2006.01)

Patent

CA 1147337

ABSTRACT A compound of the formula: Image (wherein R is dimethylamino or l-pyrrolidinyl; R1 and R2 each is hydrogen or C1-C3 alkyl; R3 is hydrogen, C1-C3 alkyl (optionally substituted by one member selected from the group consisting of cyano, C1-C3 alkoxy, phenyl, and 5- or 6-membered heterocyclic group), C3-C6 cycloalkyl, C2-C5 alkenyl (optionally substituted by one member selected from the group consisting of C1-C3 alkoxy, phenyl, and phenoxy), C6-C10 aryl (optionally substituted by one or two members selec- ted from the group consisting of hydroxy, halogen, nitro, sulfa- moyl, C1-C3 alkyl, C1-C3 alkoxy, C1-C3 alkanoyl, C2-C4 alkoxy- carbonyl, C2-C4 dialkylamino, and C1-C3 alkanesulfonyl), or 5- or 6-membered hetercyclic group (optionally substituted by one member selected from the group consisting of oxo, halogen, C1-C3 alkyl, and C1-C3 alkoxy); and X is oxygen or sulfur) and its pharmaceutically acceptable acid addition salts is use- ful as histamine H2 blockers.

366076

Affiliated with

Also associated with

Rating

Thioethylamide derivatives does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Thioethylamide derivatives, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thioethylamide derivatives will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-25148